Photodegradation of nitrobenzene using 172 nm excimer UV lamp

Journal of Hazardous Materials

Volumn 133, Issue 1-3, 2006, Pages 68-74

  Li, Qian Rong ^a   Gu, Cheng Zhi ^a   Di, Yan ^a   Yin, Hao ^a   Zhang, Jun Ying ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Degradation; Excimer UV lamp; GC HRMS; Nitrobenzene

Indexed keywords

CONCENTRATION (PROCESS); EXCIMER LASERS; GAS CHROMATOGRAPHY; MASS SPECTROMETRY; PHOTODEGRADATION; REACTION KINETICS; ULTRAVIOLET LAMPS; ULTRAVIOLET RADIATION;

EXCIMER UV LAMP;

AROMATIC COMPOUNDS;

HYDROGEN PEROXIDE; NITROBENZENE;

AROMATIC COMPOUNDS; CONCENTRATION (PROCESS); EXCIMER LASERS; GAS CHROMATOGRAPHY; MASS SPECTROMETRY; PHOTODEGRADATION; REACTION KINETICS; ULTRAVIOLET LAMPS; ULTRAVIOLET RADIATION;

ORGANIC NITROGEN COMPOUND; PHOTODEGRADATION; ULTRAVIOLET RADIATION;

ARTICLE; CONCENTRATION (PARAMETERS); IRRADIATION; PHOTODEGRADATION; ULTRAVIOLET RADIATION;

HYDROGEN PEROXIDE; IONS; MASS SPECTROMETRY; MOLECULAR STRUCTURE; NITROBENZENES; PHOTOLYSIS; SOLUTIONS; SPECTRUM ANALYSIS; ULTRAVIOLET RAYS;

EID: 33646592573     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2005.09.061     Document Type: Article

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