Radio frequency (r.f.) plasma-deposited polymer films: Influence of external plasma parameters as viewed by comprehensive in-situ surface chemical analysis by XAS, XPS and ToF-SIMS

Surface and Interface Analysis

Volumn 38, Issue 4, 2006, Pages 522-525

  Unger, W E S ^a   Swaraj, S ^a   Oran, U ^a   Lippitz, A ^a  

^a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

Author keywords

NEXAFS; Plasma deposition; Plasma parameter; ToF SIMS; XPS

Indexed keywords

ADHESION; CHEMICAL ANALYSIS; DEPOSITION; PLASMAS; RADIO WAVES; SECONDARY ION MASS SPECTROMETRY; SYNCHROTRON RADIATION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY SPECTROSCOPY;

NEXAFS; ORGANIC FILMS; PLASMA DEPOSITION; PLASMA PARAMETER; PULSED PLASMAS;

POLYMERS;

EID: 33646591585     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2158     Document Type: Conference Paper

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