HfO2-ZrO2 Doped Silica Thin Films by XPS

Surface Science Spectra

Volumn 10, Issue 1, 2003, Pages 157-163

  Armelao, Lidia ^a   Gross, Silvia ^a   Tondello, Eugenio ^a   Zattin, Andrea ^a  

^a UNIVERSITY OF PADOVA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PREPARATION; HAFNIUM OXIDES; INTERFACES (MATERIALS); MASS SPECTROMETRY; ORGANIC SOLVENTS; SOL-GEL PROCESS; SOL-GELS; SPIN GLASS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIA;

CO-POLYMERIZATION; DOPED SILICAS; EMBEDDINGS; METAL-OXIDE; METHACRYLOXYPROPYL TRIMETHOXYSILANE; MODIFIED SOL GEL PROCESSING; SILICA THIN FILMS; SILICA-GLASS; SYNTHETIC ROUTES; X-RAY PHOTOELECTRONS;

SILICA;

EID: 33646572430     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/11.20040402     Document Type: Article

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