The evolution of the electrical field drop over the suspension during EPD

Key Engineering Materials

Volumn 314, Issue , 2006, Pages 13-18

  Anné, Guy ^a   Neirinck, Bram ^a   Vanmeensel, Kim ^a   Van Der Biest, Orner ^a   Vleugels, Jef ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

E field strength; Electrophoretic deposition; Kinetics.

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRIC CURRENTS; ELECTRIC FIELD EFFECTS; ELECTRODEPOSITION; ELECTROPHORESIS; POLARIZATION;

E-FIELD STRENGTH; ELECTRODE POLARIZATION; ELECTROPHORETIC DEPOSITION; KINETICS;

ELECTRIC FIELDS;

EID: 33646569943     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/0-87849-998-9.13     Document Type: Conference Paper

References (4)

1. P. Sarkar, D. De and H. Rho, Journal of Materials Science, Vol. 39[3] (2004) p. 819.
2. OO Van der Biest OO, LJ Vandeperre, Annual Review of Materials Science, Vol. 29 (1999), p. 327
3. S. Put, J. Vleugels, G. Anné and O. Van der Biest, Colloids and Surfaces A: Physicochemical and Engineering Aspects, Vol. 222[1-3] (2003), p. 223.
4. G. Anne, B. Neirinck, K. Vanmeensel, O. Van der Biest and J. Vleugels, 'Influence of electrostatic interactions in the deposit on the electrical field strength during electrophoretic deposition', these Volume.