Throwing power during electrophoretic deposition

Key Engineering Materials

Volumn 314, Issue , 2006, Pages 187-192

  Anné, Guy ^a   Neirinck, Bram ^a   Vanmeensel, Kim ^a   Van Der Biest, Orner ^a   Vleugels, Jef ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Alumina; Electrophoretic deposition; Throwing power

Indexed keywords

ALUMINA; AMINES; COMPOSITION; ELECTRIC FIELDS; ELECTRIC POTENTIAL; ELECTRODES; ETHANOL;

COATING THICKNESS; DEPOSITION ELECTRODES; ELECTROPHORETIC DEPOSITION; THROWING POWER;

ELECTROPHORETIC COATINGS;

EID: 33646563726     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/0-87849-998-9.187     Document Type: Conference Paper

References (4)

1. OO Van der Biest OO, LJ Vandeperre, Annual Review of Materials Science, Vol. 29 (1999), p. 327
2. G. Verhoeckx and Van Leth N., In Electrophoretic Deposition: Fundamentals and Applications, eds. A.R. Boccaccini, O. Van der Biest and J. Talbot, The Electrochemical Society, Vol. 2002-2003, (2002) p. 118.
3. G. Anné, K. Vanmeensel, J. Vleugels, O. Van der Biest, Colloids and surfaces A: Physicochemical and Engineering Aspects, Vol. 245 [1-3] (2004) p. 35.
4. H. Hamaker, Trans Faraday Soc, 36 (1940) 279.