Silicasulfuric acid/NaNO3 as a new reagent for the deprotection of S,S-acetals under mild conditions

Synthesis

Volumn , Issue 9, 2006, Pages 1480-1484

  Hajipour, Abdol R ^a,b   Zarei, Amin ^a   Khazdooz, Leila ^a   Ruoho, Arnold E ^b  

^a ISFAHAN UNIVERSITY OF TECHNOLOGY   (Iran)

^b UNIVERSITY OF WISCONSIN SCHOOL OF MEDICINE AND PUBLIC HEALTH   (United States)

Author keywords

Deprotection; S,S acetal; Silicasulfuric acid; Sodium nitrate

Indexed keywords

ACETYLATION; CHEMOSTATS; ETHERS; SODIUM COMPOUNDS;

CARBONYL COMPOUNDS; DEPROTECTION; S,S-ACETAL; SILICASULFURIC ACID;

SULFURIC ACID;

4 CHLOROPHENYL 1,3 DITHIOLANE; 4 METHYLPHENYL 1,3 DITHIOLANE; ACETAL DERIVATIVE; CARBONYL DERIVATIVE; DICHLOROMETHANE; REAGENT; SILICASULFURIC ACID; SILICON DIOXIDE; SODIUM NITRATE; SULFURIC ACID; UNCLASSIFIED DRUG;

ACETALIZATION; ARTICLE; CHEMICAL STRUCTURE; DEPROTECTION REACTION; ROOM TEMPERATURE;

EID: 33646552728     PISSN: 00397881     EISSN: None     Source Type: Journal    
DOI: 10.1055/s-2006-926431     Document Type: Article

References (10)

1. Greene, T. W. Protective Groups in Organic Synthesis; Wiley: New York, 1981.
2. Kunz, H.; Waldmann, H. In Comprehensive Organic Synthesis, Vol. 6; Trost, B. M.; Fleming, I., Eds.; Pergamon: New York, 1991, 677-681.
3. Corey, E. J.; Seebach, D. J. Org. Chem. 1966, 31, 4097.
4. Mori, Y.; Kohchi, Y.; Suzuki, M. J. Org. Chem. 1991, 56, 631.
5. Hajipour, A. R.; Khoee, S.; Ruoho, A. E. Org. Prep. Proced. Int. 2003, 35, 527.
6. Kamal, A.; Reddy, P. S. M. M.; Reddy, R. Tetrahedron Lett. 2003, 44, 2857.
7. (a) Hajipour, A. R.; Mirjalili, B. F.; Zarei, A.; Khazdooz, L.; Ruoho, A. E. Tetrahedron Lett. 2004, 45, 6607.
8. (b) Zolfigol, M. A. Tetrahedron 2001, 57, 9509.
9. (a) Fuji, K.; Ichikawa, K.; Fujita, E. Tetrahedron Lett. 1978, 19, 3561.
10. (b) Zolfigol, M. A.; Mirjalili, F.; Bamoniri, A.; Karimi Zarchi, M. A.; Zarei, A.; Khazdooz, L.; Noei, J. Bull. Korean Chem. Soc. 2004, 25, 1414.