Fabrication and annihilation of nanovoids in Cu nanoclusters by ion implantation into silica and subsequent annealing

Applied Physics Letters

Volumn 88, Issue 18, 2006, Pages

  Ren, F ^a   Jiang, C Z ^a   Liu, C ^a   Wang, J B ^a  

^a WUHAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COPPER; ION IMPLANTATION; POSITIVE IONS; SILICA; TRANSMISSION ELECTRON MICROSCOPY;

HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NANOCLUSTERS; NANOVOIDS; REDUCING ATMOSPHERE;

NANOSTRUCTURED MATERIALS;

EID: 33646543023     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2201866     Document Type: Article

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