Distribution of intercalated lithium in v2O5 thin films determined by SIMS depth profiling

Surface and Interface Analysis

Volumn 38, Issue 4, 2006, Pages 847-850

  Alamarguy, D ^a   Castle, J E ^a   Liberatore, M ^b,c   Decker, F ^b  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b SAPIENZA UNIVERSITY OF ROME   (Italy)

^c DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Fluorine tin oxide; Lithium depth profiling; Lithium intercalation; Proton microbeam; SIMS; Vanadium pentoxide

Indexed keywords

CONCENTRATION (PROCESS); INTERCALATION COMPOUNDS; LITHIUM; MASS SPECTROMETRY; OXIDES; THIN FILMS; VANADIUM COMPOUNDS;

FLUORINE TIN OXIDE; LITHIUM DEPTH PROFILING; LITHIUM INTERCALATION; PROTON MICROBEAM; TIME OF FLIGHT SECONDARY ION MASS SPECTROSCOPY (TOF-SIMS); VANADIUM PENTOXIDE;

SEMICONDUCTING FILMS;

EID: 33646539164     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2139     Document Type: Conference Paper

References (4)

1. Porqueras I, Viera G, Marti J, Bertran E. Thin Solid Films 1999; 179: 343.
2. Krings LHM, Tamminga Y, Van Berkum J, Labhom F, Van Veen A, Arnoldbik WM. J. Vac. Sci. Technol., A 1999; 17(1): 198.
3. Heck D. Nucl. Instrum. Meth. B 1988; 30(3): 486.
4. Tesmer JR, Nastasi M (eds). Handbook of Modern Ion Beam Materials Analysis. MRS: Pittsburg, CA, 1995; 153, chapt. 6.