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Volumn 50, Issue 4, 2006, Pages 637-643

Differential magnetoresistance technique for mobility extraction in ultra-short channel FDSOI transistors

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; ELECTRIC RESISTANCE; MAGNETOELECTRIC EFFECTS; MOSFET DEVICES; TRANSISTORS;

EID: 33646524024     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2006.03.035     Document Type: Article
Times cited : (42)

References (13)
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    • Ohba R., and Mizuno T. Nonstationary electron/hole transport in sub-0.1 μm MOS devices: correlation with mobility and low-power CMOS application. IEEE Trans Electron Dev 48 2 (2001) 338-343
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    • Ohba, R.1    Mizuno, T.2
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    • New method for the extraction of MOSFET parameters
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  • 5
    • 20144386603 scopus 로고    scopus 로고
    • New magnetoresistance method for mobility extraction in scaled fully-depleted SOI devices
    • Gallon C., et al. New magnetoresistance method for mobility extraction in scaled fully-depleted SOI devices. Proc Int SOI Conf (2004) 153-155
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    • Gallon, C.1
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    • 33646499494 scopus 로고    scopus 로고
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  • 7
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    • Schottky-barrier profiling techniques in semiconductors: gate current and parasitic effects
    • Look D.C. Schottky-barrier profiling techniques in semiconductors: gate current and parasitic effects. J Appl Phys 57 1 (1985) 377-383
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    • Look, D.C.1
  • 8
    • 9944253353 scopus 로고    scopus 로고
    • Magnetoresistance characterization of nanometer Si metal-oxide-semiconductor transistors
    • Meziani Y.M., et al. Magnetoresistance characterization of nanometer Si metal-oxide-semiconductor transistors. J Appl Phys 96 11 (2004) 5761-5765
    • (2004) J Appl Phys , vol.96 , Issue.11 , pp. 5761-5765
    • Meziani, Y.M.1
  • 9
    • 33646512888 scopus 로고
    • Transport in the inversion layer of a MOS transistor: use of Kubo-Greenwood formalism
    • Ghibaudo G. Transport in the inversion layer of a MOS transistor: use of Kubo-Greenwood formalism. J Phys C: Solid State Phys 19 (1986) 767-780
    • (1986) J Phys C: Solid State Phys , vol.19 , pp. 767-780
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  • 10
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    • A comprehensive study of MOSFET electron mobility in both weak and strong inversion regimes
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.