Assembly of an aperture plate system for projection mask-less lithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 980-983

  Mohaupt, M ^a   Eberhardt, R ^a   Damm, C ^a   Peschel, T ^a   Tunnermann A ^a   Haugeneder, E ^b   Doring H J ^c   Brandstatter C ^d  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b IMS NANOFABRICATION AG   (Austria)

^c Vistec Electron Beam GmbH   (Germany)

^d Optics Balzers Jena GmbH   (Germany)

Author keywords

Adjustment; Alignment; Aperture plate system; Assembly; Flexure hinges; Mark detection; Projection mask less lithography

Indexed keywords

ALIGNMENT; APPLICATION SPECIFIC INTEGRATED CIRCUITS; CONSTRAINT THEORY; ELECTRON BEAM LITHOGRAPHY; MAGNETIC FIELD EFFECTS;

ADJUSTMENT; APERTURE PLATE SYSTEM; FLEXURE HINGES; MARK DETECTION; PROJECTION MASK-LESS LITHOGRAPHY;

LITHOGRAPHY;

EID: 33646486129     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.069     Document Type: Article

References (2)

1. Döring H.-J., et al. Proc. SPIE 5751 (2005)
2. Brandstätter C., et al. Proc. SPIE 5835 (2005)