Covalent molecular assembly of oligoimide ultrathin films in supercritical and liquid solvent media

Langmuir

Volumn 21, Issue 17, 2005, Pages 7812-7822

  Puniredd, Sreenivasa Reddy ^a   Srinivasan, M P ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DIAMINODIPHENYL ETHER (DDE); PYROMELLITIC DIANHYDRIDE (PMDA); UV ABSORPTION INTENSITY;

ATOMIC FORCE MICROSCOPY; CARBON DIOXIDE; NITROGEN COMPOUNDS; ORGANIC SOLVENTS; PYROMETALLURGY; SILICON; SUPERCRITICAL FLUIDS; X RAY PHOTOELECTRON SPECTROSCOPY;

ULTRATHIN FILMS;

BENZOIC ACID DERIVATIVE; CARBON DIOXIDE; DI (4 AMINOPHENYL)ETHER; DI-(4-AMINOPHENYL)ETHER; DIPHENYL ETHER DERIVATIVE; PYROMELLITIC DIANHYDRIDE; SILICON; SILICON DIOXIDE; SOLVENT;

ARTICLE; ARTIFICIAL MEMBRANE; ATOMIC FORCE MICROSCOPY; CHEMICAL STRUCTURE; CHEMISTRY; METHODOLOGY; PRESSURE; SENSITIVITY AND SPECIFICITY; SPECTROPHOTOMETRY; SURFACE PROPERTY; ULTRAVIOLET SPECTROPHOTOMETRY; X RAY;

BENZOATES; CARBON DIOXIDE; MEMBRANES, ARTIFICIAL; MICROSCOPY, ATOMIC FORCE; MOLECULAR STRUCTURE; PHENYL ETHERS; PRESSURE; QUARTZ; SENSITIVITY AND SPECIFICITY; SILICON; SOLVENTS; SPECTROPHOTOMETRY; SPECTROPHOTOMETRY, ULTRAVIOLET; SURFACE PROPERTIES; X-RAYS;

EID: 33646418188     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0509302     Document Type: Article

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