The effect of oxygen pressure on the microstructures of Co-doped rutile TiO2 thin films grown by pulsed laser deposition

Journal of Crystal Growth

Volumn 290, Issue 2, 2006, Pages 459-465

  Xin, Y ^a   Han, K ^a   Stampe, P A ^b   Kennedy, R J ^b  

^a FLORIDA STATE UNIVERSITY   (United States)

^b FLORIDA A AND M UNIVERSITY   (United States)

Author keywords

A1. Microstructure; A1. TEM; B1. Oxides; B2. Magnetic semiconductor

Indexed keywords

CRYSTAL SYMMETRY; MAGNETIC SEMICONDUCTORS; MICROSTRUCTURE; PRESSURE EFFECTS; PULSED LASER DEPOSITION; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY;

MAGNETIC COERCIVITY; RUTILE DOMAIN ORIENTATION; SUBSTRATE SURFACE;

THIN FILMS;

EID: 33646370518     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.01.037     Document Type: Article

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