Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition Growth and in Situ Characterization of Epitaxial Tio2 Films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 11, Issue 5, 1993, Pages 2419-2429

  Castro, T ^b   Chen, K M ^b   Fictorie, C P ^b   GladfeSter s, W L ^b   Franciosi, A ^b   Cohen, P I ^b   Evans, J F ^b  

^a EASTMAN KODAK COMPANY   (United States)

^b UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33646352430     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.578587     Document Type: Article

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