Nanometre scale overlay and stitch metrology using an optical microscope

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1051-1054

  Macintyre, D S ^a   Thoms, S ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

Electron beam lithography; Metrology; Overlay; Stitch

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ERRORS; MEASUREMENTS; OPTICAL MICROSCOPY; OPTICAL RESOLVING POWER;

LITHOGRAPHY TOOL; OVERLAY ERRORS; STITCH ERRORS;

NANOTECHNOLOGY;

EID: 33646064126     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.022     Document Type: Article

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