Magnetic levitation systems compared to conventional bearing systems

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1372-1375

  Peijnenburg, A T A ^a   Vermeulen, J P M ^a   van Eijk, J ^b,c  

^a Philips Applied Technologies North America   (United States)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

^c DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Cost effectiveness; Magnetic levitation; nm Level positioning performance; Semiconductor applications

Indexed keywords

COST EFFECTIVENESS; DEGREES OF FREEDOM (MECHANICS); ELECTRONIC EQUIPMENT; MAGNETIC BEARINGS; PERFORMANCE; SEMICONDUCTOR DEVICE MANUFACTURE;

MACHINE ARCHITECTURE; NM-LEVEL POSITIONING PERFORMANCE; SEMICONDUCTOR APPLICATIONS; SUBSTRATE POSITIONING;

MAGNETIC LEVITATION;

EID: 33646052009     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.248     Document Type: Article

References (1)

1. A.C.P. de Klerk, G.Z. Angelis, J. van Eijk, Design of a next generation 6-DoF stage for scanning applications in vacuum with nanometer accuracy and mGauss magnetic stray field, in: Proceedings of the 19th ASPE Annual Meeting, Orlando, FL, October 24-29, 2004, pp. 60-63.