Development of perfect silicon corrugated diaphragm using anisotropic etching

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1438-1441

  Soin, Norhayati ^a   Majlis, B Y ^b  

^a UNIVERSITY OF MALAYA   (Malaysia)

^b INSTITUTE OF MICROENGINEERING AND NANOELECTRONICS IMEN   (Malaysia)

Author keywords

Anisotropic etching; Compensation mask layout; Convex corner; Corrugated diaphragm; Design parameter

Indexed keywords

ANISOTROPY; COMPUTER SIMULATION; ETCHING; MICROELECTROMECHANICAL DEVICES; SILICON;

ANISOTROPIC ETCHING; COMPENSATION MASK-LAYOUT; CONVEX CORNER; CORRUGATED DIAPHRAGM; DESIGN PARAMETER;

DIAPHRAGMS;

EID: 33646043487     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.084     Document Type: Article

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