Hybrid lithography process for nano-scale devices

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1761-1766

  Pauliac, S ^a   Landis, S ^a   Foucher, J ^a   Thiault, J ^b   Faynot, O ^a  

^a CEA LETI   (France)

^b CNRS   (France)

Author keywords

E beam; Hybrid lithography; Standings waves

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON BEAMS; FIELD EFFECT TRANSISTORS; MOLECULAR WEIGHT; NANOSTRUCTURED MATERIALS;

CRITICAL DIMENSIONS (CD); E-BEAM; HYBRID LITHOGRAPHY; STANDINGS WAVES;

LITHOGRAPHY;

EID: 33646039365     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.240     Document Type: Article

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