Methods to reduce lithography costs with reticle engineering

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 914-918

  Mackay, R Scott ^a   Kamberian, Henry ^a   Zhang, Yuan ^a  

^a PHOTRONICS INC   (United States)

Author keywords

Cost; Lithography; Masks

Indexed keywords

COST EFFECTIVENESS; DECISION MAKING; INVESTMENTS; PRODUCT DEVELOPMENT; SILICON WAFERS; VLSI CIRCUITS;

MASKS; RETICLE ENGINEERING;

LITHOGRAPHY;

EID: 33646021322     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.242     Document Type: Article

References (2)

1. Pramanik D., Kamberian H., Progler C., Sanie M., and Pinto D. SPIE 5043 (2003) 142-152
2. E. Muzio, P. Seidel, G. Shelden, Advanced Lithography Cost of Ownership, International SEMATECH presentation, December 9, 1999.