Characterization of silicon nitride films prepared by MW-ECR magnetron sputtering

Wuli Xuebao/Acta Physica Sinica

Volumn 55, Issue 3, 2006, Pages 1363-1368

  Ding, Wan Yu ^a   Xu, Jun ^a   Li, Yan Qin ^a   Piao, Yong ^a   Gao, Peng ^a   Deng, Xin Lu ^a   Dong, Chuang ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

FT IR; Silicon nitride; WM ECR plasma sputtering; XPS

Indexed keywords

EID: 33645759993     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (24)