Copper drift in high-dielectric-constant tantalum oxide thin films under bias temperature stress

Applied Physics Letters

Volumn 88, Issue 14, 2006, Pages

  Jain, Pushkar ^a   Juneja, Jasbir S ^a   Mallikarjunan, A ^a   Rymaszewski, E J ^a   Lu, T M ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METAL DRIFTS; SWEEP TESTING; TEMPERATURE STRESSES; TRIANGULAR VOLTAGES;

CAPACITORS; COPPER; ELECTRIC POTENTIAL; IONS; OXIDES; TANTALUM COMPOUNDS; THERMAL STRESS; THIN FILMS;

SEMICONDUCTING FILMS;

EID: 33645699725     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2191832     Document Type: Article

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