Achieving sustainability in the semiconductor manufacturing industry

MICRO

Volumn 24, Issue 2, 2006, Pages 47-54

  Worth, Walter F ^a,b,c  

^a SEMATECH   (United States)

^b Sematech ^*

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

INTERNATIONAL SEMATECH MANUFACTURING INITIATIVES (ISMI); SEMICONDUCTOR INDUSTRY; SUSTAINABILITY; ULTRAPURE WATER (UPW);

CHEMICAL MECHANICAL POLISHING; ENVIRONMENTAL IMPACT; ENVIRONMENTAL PROTECTION; SUSTAINABLE DEVELOPMENT; WATER;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 33645658743     PISSN: 10810595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Review

References (6)

1. F Shadman, "New Processes and Materials for Environmentally Benign Semiconductor Manufacturing" (paper presented at the International Forum on Semiconductor Technology, Antwerp, Belgium, March 7, 2001).
2. R Chiarello, "Water Use Issues and Reduction Strategies for CMP and Post-CMP Cleaning," Sematech Technology Transfer No. 00124046A-ENG (2000).
3. T Huang, "The Characterization and Impact of an Exhaust Optimization for Two Semiconductor Process Tools," Sematech Technology Transfer No. 01024084A-TR (2001).
4. T Huang, "The Characterization and Impact of Exhaust Reduction at Various Semiconductor Process Tools," Sematech Technology Transfer No. 01014068A-ENG (2001).
5. T Huang, "Tool Energy Pareto Study," Sematech Technology Transfer No. 0094003A-ENG (2000).
6. P Naughton, "Energy Conservation at Equipment: Facts, Needs, and Vision" (paper presented at the Semicon Europa Energy Workshop, Munich, Germany, April 13, 2005).