Nondestructive metrology for nanoimprint processes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 2, 2006, Pages 686-689

  Deng, Xuegong ^a   Chen, Lei ^a   Sciortino Jr , Paul F ^a   Liu, Feng ^a   Wang, Jian J ^a  

^a NanoOpto Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOIMPRINT PROCESSES; NONDESTRUCTIVE METROLOGY; OPTICAL REFLECTANCE;

DIFFRACTION GRATINGS; LIGHT POLARIZATION; LIGHT REFLECTION; POLYMERS;

NANOTECHNOLOGY;

EID: 33645527552     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2179457     Document Type: Article

References (5)

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2. P. Schiavone, C. Gourgon, V. Farys, N. Chaix, and D. Fuard, Nanoimprint and Nanoprint Technology Conference, Vienna, Austria, 1-3 December 2004 (unpublished).
3. H. P. Kleinknecht and H. Meier, Appl. Opt. 19, 525 (1980).
4. J. Wang, L. Chen, S. Tai, X. Deng, P. F. Sciortino, J. Deng, and F. Liu, J. Lightwave Technol. 23, 474 (2005).
5. L. Li, J. Opt. Soc. Am. A 10, 2581 (1993).