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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 3 B, 2006, Pages 2022-2025

Tunneling-electron-induced hopping of methylthiolate on Cu(111)

(3) Ohara, Michiaki a Kim, Yousoo a Kawai, Maki a,b

a INST OF PHYS AND CHEMICAL RESEARCH (Japan)

b UNIVERSITY OF TOKYO (Japan)

Author keywords

Adsorption site; CH3S; Hopping phenomenon; Single molecule manipulation; STM

Indexed keywords

ELECTRIC EXCITATION; ELECTRON TUNNELING; MATHEMATICAL MODELS; ORGANIC COMPOUNDS; SCANNING TUNNELING MICROSCOPY;

ADSORPTION SITE; CH3S; HOPPING PHENOMENON; SINGLE-MOLECULE MANIPULATION; STM;

COPPER;

EID: 33645525344 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.45.2022 Document Type: Article

Times cited : (13)

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