Angular dependence of silicon oxide etching yield in fluorocarbon chemistries

Applied Physics Letters

Volumn 88, Issue 13, 2006, Pages

  Kwon, Ohseung ^a   Jin, Weidong ^a   Sawin, Herbert H ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ETCHING; FLUOROCARBON PLASMA; ION IMPINGING ANGLE; PROFILE EVOLUTION MODELING;

COMPUTER SIMULATION; DEPOSITION; FLUOROCARBONS; INDUCTIVELY COUPLED PLASMA; SILICA; SPUTTERING;

ETCHING;

EID: 33645516026     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2190465     Document Type: Article

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