Adsorption of methyl (CH3) and methylnitrene (NCH3) radicals on Cu surfaces studied by scanning tunneling microscopy

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 3 B, 2006, Pages 2372-2376

  Pai, Woei Wu ^a   Chan, Y L ^a   Chang, S W ^a   Chuang, T J ^a,b   Lin, C H ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES   (Taiwan)

Author keywords

CH3; Methyl; Methylnitrene; NCH3; Scanning tunneling microscopy; Surface structure

Indexed keywords

ADSORPTION; CHEMISORPTION; CRYSTAL STRUCTURE; MATHEMATICAL MODELS; SCANNING TUNNELING MICROSCOPY;

METHYL; METHYLNITRENE; NCH3;

NITROGEN COMPOUNDS;

EID: 33645498770     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.2372     Document Type: Article

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