RF plasma processing of Er-doped TiO2 luminescent nanoparticles

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 292-296

  Li, Ji Guang ^a   Wang, Xiao Hui ^a   Kamiyama, Hiroshi ^a   Ishigaki, Takamasa ^a   Sekiguchi, Takeshi ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Ar O2 thermal plasma; Cathodoluminescence; Er doped TiO2; Phase structure

Indexed keywords

CATHODOLUMINESCENCE; CHEMICAL ANALYSIS; ELECTRONIC STRUCTURE; ERBIUM COMPOUNDS; OXIDATION; PLASMAS; SYNTHESIS (CHEMICAL); TITANIUM OXIDES;

ANATASE AND RUTILE; AR/O2 THERMAL PLASMA; ER-DOPED TIO2; PHASE STRUCTURE; RF PLASMA PROCESSING; XRD, SEM, TEM, AND EDS;

NANOSTRUCTURED MATERIALS;

EID: 33645211399     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.093     Document Type: Conference Paper

References (6)

1. P. Ni, P. Dong, B. Cheng, X. Li, and D. Zhang Adv. Mater. 13 6 2001 437
2. S. Jeon, and P. Braun Chem. Mater. 15 2003 1256
3. C.C. Ting, S.Y. Chen, W.F. Hsieh, and H.Y. Lee J. Appl. Phys. 90 11 2001 5564
4. S.M. Oh, and T. Ishigaki Thin Solid Films 457 2004 186
5. R.A. Spurr, and H. Myers Anal. Chem. 29 1957 760
6. T. Ishigaki, Y.-L. Li, and E. Kataoka J. Am. Ceram. Soc. 86 9 2003 1456