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Volumn 17, Issue 2, 2005, Pages 89-99

Modeling of laser deposition and repair process

Author keywords

Free surface; Laser deposition; Melt pool; Modeling; Repair; Temperature distribution

Indexed keywords

ACTIVE AREA; COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; DEPOSITED MATERIALS; DUAL-WAVELENGTH; DYNAMIC EVOLUTION; FREE SURFACE; LASER AIDED DEPOSITION; LASER DEPOSITION; LASER DEPOSITIONS; LEVEL SET METHOD; LIQUID-VAPOR; MANUFACTURING PROCESS; MATERIAL DEPOSITION; MELT POOL; MODELING; PEAK TEMPERATURES; POWDER HEATING; POWDER INJECTION; REPAIR PROCESS; SIMULATION RESULT; SMALL SCALE; SOLID-LIQUID INTERFACES; SUBSTRATE MELTING;

EID: 33645155931     PISSN: 1042346X     EISSN: None     Source Type: Journal    
DOI: 10.2351/1.1848523     Document Type: Article
Times cited : (54)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.