Enhanced diffusion of oxygen in silicon due to resonant laser excitation of local vibrational mode

Physica B: Condensed Matter

Volumn 376-377, Issue 1, 2006, Pages 66-68

  Yamada Kaneta, H ^a   Tanahashi, K ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Diffusion; Laser; Oxygen; Silicon

Indexed keywords

CHEMICAL BONDS; CRYSTALS; ELECTRIC EXCITATION; IMPURITIES; INFRARED DEVICES; IRRADIATION; LASERS; OXYGEN; RESONATORS; SILICON; VIBRATIONS (MECHANICAL); WAVES;

ENHANCED DIFFUSION; LOCAL VIBRATIONAL MODE; OXYGEN-LOCALIZED VIBRATIONS; RESONANT LASER EXCITATION; WAVE NUMBER;

DIFFUSION;

EID: 33645155796     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2005.12.018     Document Type: Conference Paper

References (2)

1. H. Yamada-Kaneta, K. Tanahashi, in: Proceedings of the Fourth International Symposium on Advanced Science and Technology of Silicon Materials, November 22-26, 2004, Kona, Hawaii, USA, pp. 305-308.
2. K. Kakimoto, to be presented elsewhere.