3D-XY critical behavior in La2-xSrxCuO4 thin films probed by penetration depth measurement

Czechoslovak Journal of Physics

Volumn 46, Issue SUPPL. 2, 1996, Pages 1079-1080

  Jaccard, Y ^a,b   Schneider, T ^b   Locquet, J P ^b   Williams, E J ^b,c   Fischer, O ^c   Martinoli, P ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

^b IBM RESEARCH ZURICH   (Switzerland)

^c UNIVERSITY OF GENEVA   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33645031878     PISSN: 00114626     EISSN: 15729486     Source Type: Journal    
DOI: 10.1007/BF02583847     Document Type: Article

References (6)

1. T. Schneider and D. Ariosa, Z. Phys. B 89, 267-274 (1992).
2. Y. Jaccard, A. Cretton, E. J. Williams, J.-P. Locquet, E. Mäichler, C. Gerber, T. Schneider, Ø. Fischer and P. Martinoli, Proc. of SPIE Conf. on Oxide Superconductors Physics and Nano- Engineering, SPIE 2158, 200 (1994).
3. H. Takagi, T. Ido, S. Ishibashi, M. Uota, S. Uchida and Y. Tokura, Phys. Rev. B 40, 2254-2261 (1989).
4. Y. Jaccard, T. Schneider, J.-P. Locquet, E. J. Williams, P. Martinoli and Ø. Fischer, aceepted for publication in Europhys. Lett. (February 1996)
5. M. P. A. Fisher, P. B. Weichman, G. Grinstein and D. S. Fisher, Phys. Rev. B 40, 546-570 (1989).
6. T. Schneider et al., submitted in Nature.