Fabrication and quantum conductance of electroplated Ni nanocontacts

Physics Letters, Section A: General, Atomic and Solid State Physics

Volumn 352, Issue 4-5, 2006, Pages 331-334

  Sahoo, S ^a   Yang, C S ^a,b   Doudin, B ^a  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^b UNIVERSITY OF MASSACHUSETTS   (United States)

Author keywords

Magnetic nanocontacts; Quantum conductance

Indexed keywords

ELECTRODEPOSITION; ELECTRODES; ETCHING; FIELD EMISSION MICROSCOPES; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

DISSOLUTION PROCESS; ELECTROPLATED NI; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FOCUSED ION BEAM ETCHING; MAGNETIC NANOCONTACTS; MICROFABRICATED; NANO-METER SCALE; QUANTUM CONDUCTANCE;

ION BEAMS;

EID: 33644982952     PISSN: 03759601     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physleta.2005.12.006     Document Type: Article

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