Chemical mechanical polishing of BTO thin film for vertical sidewall patterning of high-density memory capacitor

Thin Solid Films

Volumn 504, Issue 1-2, 2006, Pages 261-264

  Kim, Nam Hoon ^a   Ko, Pil Ju ^a   Seo, Yong Jin ^b   Lee, Woo Sun ^a  

^a Chosun University   (South Korea)

^b Daebul University   (South Korea)

Author keywords

Barium titanate (BTO); Chemical mechanical polishing (CMP); Patterning; Selectivity; Silica slurry; Vertical sidewall

Indexed keywords

BARIUM TITANATE; CAPACITOR STORAGE; CHEMICAL MECHANICAL POLISHING; DYNAMIC RANDOM ACCESS STORAGE; PERMITTIVITY; PLASMA APPLICATIONS;

PATTERNING; SELECTIVITY; SILICA SLURRY; VERTICAL SIDEWALL;

THIN FILMS;

EID: 33644899074     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.170     Document Type: Conference Paper

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