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Volumn 6013, Issue , 2005, Pages

Roadmap for high efficiency solid-state neutron detectors

Author keywords

Alpha; Boron; High density plasma etching; Nanowires; Neutron detection; Pillars; Pixel array

Indexed keywords

ALPHA; HIGH DENSITY PLASMA ETCHING; PILLARS; PIXEL ARRAY;

EID: 33644809395     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.633256     Document Type: Conference Paper
Times cited : (38)

References (14)
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    • The effect of incremental gamma-ray doses and incremental neutron fluences upon the performance of self-biased 10B-coated high-purity epitaxial GaAs thermal neutron detectors
    • H. K. Gersch, D.S. McGregor, and P.A. Simpson, "The effect of incremental gamma-ray doses and incremental neutron fluences upon the performance of self-biased 10B-coated high-purity epitaxial GaAs thermal neutron detectors," Nuclear Instruments and Methods in Physics Research A, 489, pp. 85-98, 2002.
    • (2002) Nuclear Instruments and Methods in Physics Research A , vol.489 , pp. 85-98
    • Gersch, H.K.1    McGregor, D.S.2    Simpson, P.A.3
  • 6
    • 33751122778 scopus 로고
    • Vapor-liquid-solid mechanism of single crystal growth
    • R. A. Wagner, and W.C. Ellis, "Vapor-Liquid-Solid Mechanism of Single Crystal Growth," Appl. Phys. Lett. 4, pp. 89-90, 1964.
    • (1964) Appl. Phys. Lett. , vol.4 , pp. 89-90
    • Wagner, R.A.1    Ellis, W.C.2
  • 9
    • 0034505170 scopus 로고    scopus 로고
    • High aspect-ratio polysilicon micromachining technology
    • F. Ayazi and K. Najafi, "High aspect-ratio polysilicon micromachining technology," Sensors and Actuators A, 87, pp. 46-51, 2000.
    • (2000) Sensors and Actuators A , vol.87 , pp. 46-51
    • Ayazi, F.1    Najafi, K.2
  • 10
    • 0042029592 scopus 로고    scopus 로고
    • Critical tasks in high aspect ratio silicon dry etching for microelectromechanical systems
    • Rangelow, I.W., Critical tasks in high aspect ratio silicon dry etching for microelectromechanical systems, Journal of Vacuum Science Technology A, 21, 1550-1562, 2003.
    • (2003) Journal of Vacuum Science Technology A , vol.21 , pp. 1550-1562
    • Rangelow, I.W.1
  • 13
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    • The preparation of B-Sb thin films by molecular flow region PVD process
    • Y. Kumashiro, K. Nakamura, Y. Doi, K. Hirata, T. Yokoyama, and K. Sato, "The preparation of B-Sb thin films by molecular flow region PVD process," J. Crystal Growth, 237-239, pp. 1531-1535, 2002.
    • (2002) J. Crystal Growth , vol.237-239 , pp. 1531-1535
    • Kumashiro, Y.1    Nakamura, K.2    Doi, Y.3    Hirata, K.4    Yokoyama, T.5    Sato, K.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.