The problem of core/shell nanoclusters formation during ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 245, Issue 2, 2006, Pages 427-430

  Ren, F ^a   Jiang, C Z ^a   Wang, Y H ^a   Wang, Q Q ^a   Wang, J B ^a  

^a WUHAN UNIVERSITY   (China)

Author keywords

Ion implantation; Nanocluster; Nanovoids; Nonlinear properties

Indexed keywords

CURRENT DENSITY; IMAGE PROCESSING; ION IMPLANTATION; SILICA; TRANSMISSION ELECTRON MICROSCOPY;

NANOCLUSTER; NANOVOIDS; NONLINEAR PROPERTIES;

NANOSTRUCTURED MATERIALS;

EID: 33644805275     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.11.052     Document Type: Article

References (15)

1. A.L. Stepanov, D.E. Hole, and P.D. Townsend J. Non.-Cryst. Solid 260 1999 65
2. A.L. Stepanov, and R.I. Khaibullin Rev. Adv. Mater. Sci. 7 2004 108
3. C. de Julián Fernández, M.A. Tagliente, G. Mattei, C. Sada, V. Bello, C. Maurizio, G. Battaglin, C. Sangregorio, D. Gatteschi, L. Tapfer, and P. Mazzoldi Nucl. Instr. and Meth. B 216 2004 245
4. G. Battaglin, E. Cattaruzza, G. De Marchi, F. Gonella, G. Mattei, C. Maurizio, P. Mazzoldi, M. Parolin, C. Sada, and I. Calliari Nucl. Instr. and Meth. B 191 2002 392
5. C. de Julián Fernández, C. Sangregorio, G. Mattei, C. Maurizio, G. Battaglin, F. Gonella, A. Lascialfri, S. Lo Russo, D. Gatteschi, P. Mazzoldi, J.M. Gonzalez, and F. D'Acapito Nucl. Instr. and Meth. B 175-177 2001 479
6. A. Meldrum, L.A. Boatner, and C.W. White Nucl. Instr. and Meth. B 178 2001 7
7. A.L. Stepanov, V.N. Popok, D.E. Hole, and I.B. Khaibullin Appl. Phys. A 74 2002 441
8. J.H. Yang, and T.H. Zhang Surf. Rev. Lett. 11 2004 363
9. P.B. Johnson, A. Markwitz, and P.W. Gilberd Adv. Mater. 13 2001 12
10. S.Y. Zhu, Y.J. Xu, Z.Q. Wang, Y.N. Zheng, D.M. Zhou, E.P. Du, D.Q. Yuan, M. Fukuda, M. Mihara, K. Matsuta, and T. Minamisono J. Nucl. Mater. 343 2005 330
11. J.C. Kim, D.G. Cahill, and R.S. Averback Phys. Rev. B 68 2003 094109
12. B.J. Kooi, A. van Veen, J.T.M. De Hosson, H. Schut, A.V. Fedorov, and F. Labohm Appl. Phys. Lett. 76 2000 1110
13. M. Sheik-Bahae, A.A. Said, T.H. Wei, D.J. Hagan, and E.W. Van Stryland IEEE J. Quantum Electron. 26 1990 760
14. D. Milam Appl. Opt. 37 1998 546
15. D.H. Osborne Jr., R.F. Haglund Jr., F. Gonella, and F. Garrido Appl. Phys. B 66 1998 517