Summary of ISO/TC 201 standard: XIII, ISO 18114:2003 - Surface chemical analysis - Secondary ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials

Surface and Interface Analysis

Volumn 38, Issue 3, 2006, Pages 171-172

  Simons, D S ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Ion implantation; Reference material; Relative sensitivity factor; RSF; SIMS

Indexed keywords

COMPOSITION; CONCENTRATION (PROCESS); ION IMPLANTATION; SECONDARY ION MASS SPECTROMETRY;

ATOMIC PERCENT; REFERENCE MATERIALS; RELATIVE SENSITIVITY FACTOR (RSF); SPECIMENS;

SURFACE CHEMISTRY;

EID: 33644774453     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2316     Document Type: Article

References (1)

1. Wilson RG, Stevie FA, Magee CW. Secondary Ion Mass Spectrometry - A Practical Handbook for Depth Profiling and Bulk Impurity Analysis. John Wiley and Sons: New York, 1989); Section 3.1.