Flotation separation of SiC from wastes in the silicon wafer slicing process

Kagaku Kogaku Ronbunshu

Volumn 32, Issue 1, 2006, Pages 93-98

  Shibata, Junji ^a   Murayama, Norihiro ^a   Nagae, Kengo ^a  

^a KANSAI UNIVERSITY   (Japan)

Author keywords

Fine Particle; Flotation; Semiconductor Production; SiC; SiO2

Indexed keywords

ADSORPTION; FLOTATION; FLOW OF FLUIDS; PARTICLE SIZE ANALYSIS; PH EFFECTS; POSITIVE IONS; SILICA; SILICON WAFERS; SURFACE ACTIVE AGENTS;

FINE PARTICLES; SEMICONDUCTOR PRODUCTION; SIC; SIO2;

SILICON CARBIDE;

EID: 33644751314     PISSN: 0386216X     EISSN: 13499203     Source Type: Journal    
DOI: 10.1252/kakoronbunshu.32.93     Document Type: Article

References (7)

1. Fuerstenau, D. W.; "Interfacial Processes in Mineral/Water Systems," Pure and Applied Chemistry, 24, 135-164 (1970)
2. Fuerstenau, M. C.; "Role of Metal Ion Hydrolysis in Oxide and Silicate Flotation Systems," AIChE Symposium Series, Vol. 150, pp. 16-23, AIChE, New York, U.S.A. (1975)
3. Fuerstenau, D. W. and J. Shibata; "On Using Electrokinetics to Interpret the Holation and Interfacial Behavior of Manganese Dioxide," Int. J. Miner. Process., 87, 205-217 (1999)
4. Kaimenkasseizai Bunsekikenkyukai ed.; Analysis Method of Surfactant (Shinpan Kaimenkasseizai Bunsekiho), Miyuki Syobou, pp.317-318, Tokyo, Japan (1987)
5. Kusaka, E., S. Yano, Y. Fukunaka and R. Ishii; "Fundamental Study on Separation of Silicon Compound Particles with Flotation" (in Japanese), Proc. MMIJ Annual Meeting 2003, II, pp. 83-84, Tokyo, Japan (2003)
6. Shibata, J. and D. W. Fuerstenau; "Flocculation and Flotation Characteristics of Fine Hematite with Sodium Oleate," Int. J. Miner. Process., 72, 25-32 (2003)
7. Yoshikawa, M., E. Kusaka, Y. Fukunaka and R. Ishii; "Fundamental Study on Column Flotation of Submicron SiC Particles" (in Japanese), Proc. MMIJ Annual Meeting 2002, II, pp. 76-77, Tokyo, Japan (2002)