Thickness-dependent properties of FeTaN thin films deposited on flexible substrate

Journal of Applied Physics

Volumn 99, Issue 4, 2006, Pages

  Liu, Z W ^a   Liu, Y ^a   Yan, L ^a   Tan, C Y ^a   Ong, C K ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

IRON COMPOUNDS; MAGNETIC PROPERTIES; MAGNETRON SPUTTERING; RESONANCE; SUBSTRATES;

PERMEABILITY LEVEL; RESONANCE PEAK; SHEET RESISTANCE;

THIN FILMS;

EID: 33644627713     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2170588     Document Type: Article

References (18)

1. G. Qiu, E. Haftek, and J. A. Barnard, J. Appl. Phys. 73, 6573 (1993).
2. S. G. Wang, C. K. Ong, and Z. W. Li, Physica B 349, 129 (2004).
3. C. Alexander, Jr. and J. Rantschler, J. Appl. Phys. 87, 6633 (2000).
4. J. Veldeman, H. Jia, and M. Burgelman, J. Magn. Magn. Mater. 193, 128 (1999).
5. J. Veldeman, H. Jia, and M. Burgelman, Surf. Sci. 454-456, 904 (2000).
6. I. T. Iakubov, A. N. Lagarkov, S. A. Makalakov, A. V. Osipov, K. N. Rozanov, I. A. Ryzhikov, N. A. Simonov, and S. N. Starostenko, J. Magn. Magn. Mater. 258-259, 195 (2003).
7. C. A. Grimes, IEEE Trans. Magn. 31, 4109 (1995).
8. Y. Liu, L. F. Chen, C. Y. Tan, H. J. Liu, and C. K. Ong, Rev. Sci. Instrum. 76, 063911 (2005).
9. Product technical data, http://www.goodfellow.com/csp/active/gfHome.csp, 01/07/2005.
10. S. G. Wang, H. B. Nie, C. K. Ong, Z. W. Li, G. P. Zhao, and J. P. Wang, Physica B 334, 193 (2003).
11. H. B. Nie, S. Y. Xu, C. K. Ong, Q. Zhan, D. X. Li, and J. P. Wang, Thin Solid Films 440, 35 (2003).
12. C. B. Craus, A. R. Chezan, D. O. Boerma, and L. Niesen, J. Magn. Magn. Mater. 240, 423 (2002).
13. J. B. Youssef and N. Vukadinovic, Phys. Rev. B 69, 174402 (2004).
14. I. T. Iakubov, A. N. Lagarkov, S. A. Maklakov, A. V. Osipov, K. N. Rozanov, I. A. Ryzhikov, and S. N. Starostenko, J. Magn. Magn. Mater. 272-276, 2208 (2004).
15. V. Bekker, K. Seemann, and H. Leiste, J. Magn. Magn. Mater. 296, 37 (2006).
16. B. Viala, M. K. Minor, and J. A. Barnard, J. Appl. Phys. 80, 3941 (1996).
17. S. Jin, W. Zhu, R. B. Van Dover, T. H. Tiefel, V. Korenivski, and L. H. Chen, Appl. Phys. Lett. 70, 3161 (1997).
18. H. B. Nie, S. Y. Xu, J. Li, and C. K. Ong, J. Appl. Phys. 91, 7532 (2002).