메뉴 건너뛰기




Volumn 5991, Issue , 2005, Pages

Manufacture and development of multilayer diffraction gratings

Author keywords

Dielectric gratings; MLD gratings; Reactive etching; RIBE

Indexed keywords

DIELECTRIC GRATINGS; MLD GRATINGS; REACTIVE ETCHING;

EID: 33644586584     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.638819     Document Type: Conference Paper
Times cited : (18)

References (11)
  • 1
    • 0022236671 scopus 로고
    • Compression of amplified chirped optical pulses
    • D. Strickland and G. Mourou, "Compression of amplified chirped optical pulses," Opt. Commun. 56(3), 219-221 (1985).
    • (1985) Opt. Commun. , vol.56 , Issue.3 , pp. 219-221
    • Strickland, D.1    Mourou, G.2
  • 2
    • 0032613705 scopus 로고    scopus 로고
    • Short-pulse laser damage in transparent materials as a function of pulse duration
    • A.-C. Tien, S. Backus, H. Kapteyn, M. Murnane, and G. Mourou, "Short-pulse laser damage in transparent materials as a function of pulse duration," Phys. Rev. Lett. 82(19), 3883-3886 (1999).
    • (1999) Phys. Rev. Lett. , vol.82 , Issue.19 , pp. 3883-3886
    • Tien, A.-C.1    Backus, S.2    Kapteyn, H.3    Murnane, M.4    Mourou, G.5
  • 3
    • 1642603843 scopus 로고    scopus 로고
    • Demonstration of coherent addition of multiple gratings for high-energy chirped-pulse-amplified lasers
    • T. J. Kessler, J. Bunkenburg, H. Huang, A. Kozlov, and D. D. Meyerhofer, "Demonstration of coherent addition of multiple gratings for high-energy chirped-pulse-amplified lasers," Opt. Lett. 29(6), 635-637 (2004).
    • (2004) Opt. Lett. , vol.29 , Issue.6 , pp. 635-637
    • Kessler, T.J.1    Bunkenburg, J.2    Huang, H.3    Kozlov, A.4    Meyerhofer, D.D.5
  • 7
    • 0000282358 scopus 로고
    • Residual stresses in evaporated silicon dioxide thin films: Correlation with deposition parameters and aging behavior
    • H. Leplan, B. Geenen, J. Y. Robic, and Y. Pauleau, "Residual stresses in evaporated silicon dioxide thin films: Correlation with deposition parameters and aging behavior," J. Appl. Phys. 78(2), 962-967 (1995).
    • (1995) J. Appl. Phys. , vol.78 , Issue.2 , pp. 962-967
    • Leplan, H.1    Geenen, B.2    Robic, J.Y.3    Pauleau, Y.4
  • 8
    • 0348197108 scopus 로고    scopus 로고
    • Enhancement of collimated low-energy broad-beam ion source with four-grid accelerator system
    • E. K. Wåhlin, M. Watanabe, J. Shimonek, D. Burtner, and D. Siegfried, "Enhancement of collimated low-energy broad-beam ion source with four-grid accelerator system," Appl. Phys. Lett. 83(23), 4722-4724 (2003).
    • (2003) Appl. Phys. Lett. , vol.83 , Issue.23 , pp. 4722-4724
    • Wåhlin, E.K.1    Watanabe, M.2    Shimonek, J.3    Burtner, D.4    Siegfried, D.5
  • 9
    • 0017946534 scopus 로고
    • Profile control by reactive sputter etching
    • H. W. Lehmann and R. Widmer, "Profile control by reactive sputter etching," J. Vac. Sci. Technol. 15(2), 319-326 (1978).
    • (1978) J. Vac. Sci. Technol. , vol.15 , Issue.2 , pp. 319-326
    • Lehmann, H.W.1    Widmer, R.2
  • 10
    • 0141968438 scopus 로고    scopus 로고
    • The development of ion-etched phase plates
    • NTIS document No. DOE/SF/19460-241. Copies may be obtained from the National Technical Information Service, Springfield, VA 22161
    • "The development of ion-etched phase plates," Laboratory for Laser Energetics LLE Review 74, 71-91, NTIS document No. DOE/SF/19460-241 (1998). Copies may be obtained from the National Technical Information Service, Springfield, VA 22161.
    • (1998) Laboratory for Laser Energetics LLE Review , vol.74 , pp. 71-91


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.