In situ high-resolution transmission electron microscopy study of interfacial reactions of Cu thin films on amorphous silicon

Applied Physics Letters

Volumn 88, Issue 8, 2006, Pages

  Lee, Sung Bo ^a   Choi, Duck Kyun ^a   Phillipp, Fritz ^b   Jeon, Kyung Sook ^a   Kim, Chang Kyung ^a  

^a Hanyang University   (South Korea)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CU PARTICLES; ELECTRON BEAM IRRADIATION; GLASS SYSTEMS; INTERFACIAL REACTIONS;

AMORPHOUS SILICON; COPPER; CRYSTALLIZATION; ELECTRON BEAMS; ELEMENTARY PARTICLES; HIGH RESOLUTION ELECTRON MICROSCOPY; IRRADIATION; METALLIC GLASS;

THIN FILMS;

EID: 33644542107     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2179143     Document Type: Article

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