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Volumn 25, Issue 7, 2004, Pages 495-497

Temperature effect on read current in a two-bit nitride-based trapping storage flash EEPROM cell

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; CELLULAR ARRAYS; COMPUTER SIMULATION; CURRENT VOLTAGE CHARACTERISTICS; HIGH TEMPERATURE EFFECTS; LEAKAGE CURRENTS; MOSFET DEVICES; NITRIDES; THRESHOLD VOLTAGE;

EID: 3343017574     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2004.830275     Document Type: Article
Times cited : (10)

References (9)
  • 2
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    • High performance SONOS memory cells free of drain turn-on and over-erase: compatibility issue with current Flash technology
    • Aug
    • M. K. Cho and D. M. Kim, "High performance SONOS memory cells free of drain turn-on and over-erase: compatibility issue with current Flash technology," IEEE Electron Device Lett., vol. 21, pp. 399-401, Aug. 2000.
    • (2000) IEEE Electron Device Lett. , vol.21 , pp. 399-401
    • Cho, M.K.1    Kim, D.M.2
  • 5
    • 84876716278 scopus 로고
    • Design considerations in high temperature analog CMOS integrated circuits
    • Sept
    • F. S. Shoucair, "Design considerations in high temperature analog CMOS integrated circuits," IEEE Trans. Comp., Hybrids, Manufact. Technol., vol. CHMT-9, pp. 242-251, Sept. 1986.
    • (1986) IEEE Trans. Comp., Hybrids, Manufact. Technol. , vol.CHMT-9 , pp. 242-251
    • Shoucair, F.S.1
  • 6
    • 0024888874 scopus 로고
    • Scaling, subthreshold, and leakage current matching characteristics in high-temperature (25 °C-250 °C) VLSI CMOS devices
    • Dec
    • F. S. Shoucair, "Scaling, subthreshold, and leakage current matching characteristics in high-temperature (25 °C-250 °C) VLSI CMOS devices," IEEE Trans. Comp., Hybrids, Manuf. Technol., vol. 12, pp. 780-788, Dec. 1989.
    • (1989) IEEE Trans. Comp., Hybrids, Manuf. Technol. , vol.12 , pp. 780-788
    • Shoucair, F.S.1
  • 7
    • 0027239315 scopus 로고
    • Threshold voltage modeling and the subthreshold regime of operation of short-channel MOSFET's
    • Jan
    • T. A. Fjeldly, "Threshold voltage modeling and the subthreshold regime of operation of short-channel MOSFET's," IEEE Trans. Electron Device, vol. 40, pp. 137-145, Jan. 1993.
    • (1993) IEEE Trans. Electron Device , vol.40 , pp. 137-145
    • Fjeldly, T.A.1
  • 8
    • 0035506164 scopus 로고    scopus 로고
    • Characterization of channel hot electron injection by the subthreshold slope of NROM device
    • Nov
    • E. Lusky, Y. Shacham-Diamand, I. Bloom, and B. Eitan, "Characterization of channel hot electron injection by the subthreshold slope of NROM device," IEEE Electron Device Lett., vol. 22, pp. 556-558, Nov. 2001.
    • (2001) IEEE Electron Device Lett. , vol.22 , pp. 556-558
    • Lusky, E.1    Shacham-Diamand, Y.2    Bloom, I.3    Eitan, B.4
  • 9
    • 1642338027 scopus 로고    scopus 로고
    • Investigation of the spatial distribution of CHE injection utilizing the subthreshold slope and the Gate induced drain leakage (GIDL) characteristics of the NROM device
    • E. Lusky, I. Bloom, and B. Eitan, "Investigation of the spatial distribution of CHE injection utilizing the subthreshold slope and the Gate induced drain leakage (GIDL) characteristics of the NROM device," in Proc. Non-Volatile Semiconductor Memory Workshop, 2003,
    • (2003) Proc. Non-Volatile Semiconductor Memory Workshop , pp. 48-49
    • Lusky, E.1    Bloom, I.2    Eitan, B.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.