Low-temperature selective-area deposition of metals: Chemical vapor deposition of gold from ethyl(trimethylphosphine)gold(I)

Applied Physics Letters

Volumn 62, Issue 13, 1993, Pages 1475-1477

  Banaszak Holl, M M ^a   Seidler, P F ^a   Kowalczyk, S P ^a   McFeely, F R ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

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EID: 3342974875     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.108663     Document Type: Article

References (6)