Composition control and its influence to the magnetic properties of TbFex film

Journal of Magnetism and Magnetic Materials

Volumn 280, Issue 1, 2004, Pages 143-146

  Zhang, W X ^a   Zhang, W L ^a   Lin, L W ^a   Peng, B ^a   Jiang, H C ^a   Yang, S Q ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Composition control; Magnetic domain; Magnetostrictive film; Magnetron sputtering; MFM

Indexed keywords

ACTUATORS; ENERGY DISPERSIVE SPECTROSCOPY; KINETIC ENERGY; MAGNETIC DOMAINS; MAGNETIC FIELDS; MAGNETIZATION; MAGNETOSTRICTION; MAGNETRON SPUTTERING; PIEZOELECTRIC MATERIALS; SENSORS; TERBIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

COMPOSITION CONTROL; GAS PRESSURE; MAGNETIC FORCE MICROSCOPY (MFM); MAGNETOSTRICTIVE FILMS;

MAGNETIC FILMS;

EID: 3342973815     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2004.03.001     Document Type: Article

References (10)

1. E. Quandt, K. Seemann, MEMS, 1995, Proceedings IEEE, 29 (2) (1995) 273.
2. Hristoforou E., Reilly R.E. IEEE Trans. Magn. 30(5):1994;2728.
3. Inoue M., Fujii T., Gibbs M.R.J. IEEE Trans. Magn. 32(5):1996;4758.
4. Shima Toshiyuki, Takanashi K., Fujimori H. Sensor and Actuators A. 91:2001;210.
5. Shima Toshiyuki, Yokoyama Hircyuki, Fujimori Hiroyasu J. Alloys Comp. 258:1997;149.
6. Zhang W.X., Zhang W.L., H.C. Jiang B.Peng, Yang S.Q. J. Magn. Magn. Mater. 261/1-2:2003;118.
7. Na S.M., Suh S.J., Lim S.H. J. Appl. Phys. 93(10):2003;8507.
8. M.L. Escrivao, A.M.C. Moutinho, M.J.P. Maneira, J. Vac. Sci. Technol. A 12(3) (1994) 723.
9. O'Handley R.C. Modern Magnetic Materials: Principles and Applications. 2000;Wiley, New York.
10. Kim Kyeong-Sup, Song Young-Yeal, Cho Yu Seong, Ho Lim Sang J. Magn. Magn. Mater. 196-197:1999;854.