Henkel plots for thermally relaxing systems

Journal of Applied Physics

Volumn 81, Issue 8 PART 2B, 1997, Pages 5230-5232

  Klik, I ^a   Yao, Y D ^a   Chang, C R ^b  

^a INSTITUTE OF PHYSICS   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3342927883     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.364476     Document Type: Article

References (8)

1. O. Henkel, Phys. Status Solidi 7, 919 (1964).
2. V. Basso and G. Bertotti, IEEE Trans. Magn. 30, 64 (1994).
3. X. Che and H. N. Bertram, J. Magn. Magn. Mater. 116, 121 (1992).
4. W. Chen, S. Zhang, and H. N. Bertram, J. Appl. Phys. 71, 5579 (1992).
5. I. Klik and C. R. Chang, Phys. Rev. B 52, 3540 (1995).
6. I. Klik, J. S. Yang, and C. R. Chang, J. Appl. Phys. 76, 6493 (1994).
7. I. Klik, C. R. Chang, and H. L. Huang, Phys. Rev. B 48, 15823 (1993); I. Klik, J. Appl. Phys. 73, 6725 (1993).
8. I. Klik, C. R. Chang, and H. L. Huang, Phys. Rev. B 48, 15823 (1993); I. Klik, J. Appl. Phys. 73, 6725 (1993).