Total reflection PIXE (TPIXE) and RBS for surface and trace element analysis

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 109-110, Issue , 1996, Pages 85-93

  Van Kan, J A ^a   Vis, R D ^a  

^a VU UNIVERSITY AMSTERDAM   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

PARTICLE BEAMS; PROTONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON WAFERS; SUBSTRATES; SURFACES; TRACE ELEMENTS;

INCIDENT ANGLES; PARTICLE INDUCED X RAY EMISSIONS (PIXE); SURFACE CHANNELING; TOTAL REFLECTION GEOMETRY;

X RAY SPECTROSCOPY;

EID: 3342917513     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)00890-X     Document Type: Article

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