A comparison of polyatomic ion deposited, RF magnetron sputtered and plasma polymer organosilicon films

Thin Solid Films

Volumn 502, Issue 1-2, 2006, Pages 40-43

  Choukourov, A ^a   Grinevich, A ^a   Hanus J ^a   Kousal, J ^a   Slavinska D ^a   Biederman, H ^a   Bowers, A ^b   Hanley, L ^b  

^a CHARLES UNIVERSITY   (Czech Republic)

^b UNIVERSITY OF ILLINOIS AT CHICAGO   (United States)

Author keywords

Ion bombardment; Organosilicon polymer; Plasma processing and plasma deposition

Indexed keywords

DERIVATIVES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION BOMBARDMENT; MAGNETRON SPUTTERING; ORGANOMETALLICS; PLASMAS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL DERIVATIZATION; ORGANOSILICON POLYMER; PLASMA POLYMERS; PLASMA PROCESSING AND PLASMA DEPOSITION;

THIN FILMS;

EID: 33344477025     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.231     Document Type: Conference Paper

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