Advanced generation of rotatable magnetron technology for high performance reactive sputtering

Thin Solid Films

Volumn 502, Issue 1-2, 2006, Pages 15-21

  Nadel, S J ^a   Greene, P ^a   Rietzel, J ^a   Perata, M ^a   Malaszewski, L ^a   Hill, R ^a  

^a VACUUM COATING Technologies   (United States)

Author keywords

Deposition process; Optical coatings; Sputtering

Indexed keywords

COATINGS; DENSITY (OPTICAL); DEPOSITION; GLASS; VACUUM APPLICATIONS;

DEPOSITION PROCESS; DEPOSITION RATES; REACTIVE SPUTTERING;

MAGNETRON SPUTTERING;

EID: 33344471775     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.227     Document Type: Conference Paper

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