SCOPUS 정보 검색 플랫폼

Volumn 289, Issue 1, 2006, Pages 89-95

Pattern size effect on source supply process for sub-micrometer scale selective area growth by organometallic vapor phase epitaxy

Author keywords

A1. Crystal morphology; A1. Growth models; A3. Organometallic vapor phase epitaxy; A3. Selective epitaxy; B2. Semiconducting III V materials

Indexed keywords

CRYSTALS; DIFFUSION; MORPHOLOGY; SEMICONDUCTOR MATERIALS; SURFACE CHEMISTRY;

CRYSTAL MORPHOLOGY; GROWTH MODELS; ORGANOMETALLIC VAPOR PHASE EPITAXY; SELECTIVE EPITAXY; SEMICONDUCTING III-V MATERIALS;

METALLORGANIC VAPOR PHASE EPITAXY;

EID: 33244466499 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.11.088 Document Type: Article

Times cited : (16)

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