Plasma monitoring of the RLVIP-process with a Langmuir probe

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5963, Issue , 2005, Pages

  Huber, D ^a   Hallbauer, A ^a   Pulker, H K ^a  

^a UNIVERSITY OF INNSBRUCK   (Austria)

Author keywords

Ion plating; Langmuir probe; Nb2O 5; Plasma characterisation; Ta2O5

Indexed keywords

CURRENT DENSITY; DEPOSITION; ELECTRIC POTENTIAL; EVAPORATION; LANGMUIR BLODGETT FILMS; PARTIAL PRESSURE; REFRACTIVE INDEX; THIN FILMS;

ION PLATING; LANGMUIR PROBE; NB2O 5; PLASMA CHARACTERISATION; TA2O5;

PLASMA APPLICATIONS;

EID: 33144486710     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.624856     Document Type: Conference Paper

References (12)

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