Using fast atomic source and low-energy plasma ions for polymer surface modification

Vacuum

Volumn 80, Issue 6, 2006, Pages 643-646

  Dhayal, Marshal ^a   Awasthi, K ^b   Vijay, Y K ^b   Avasthi, D K ^c  

^a Dongshin University   (South Korea)

^b UNIVERSITY OF RAJASTHAN   (India)

^c INTER UNIVERSITY ACCELERATOR CENTRE   (India)

Author keywords

Fast atomic source; Low energy plasma; PS; Surface modification

Indexed keywords

ARGON; POLYSTYRENES; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

FAST-ATOMIC SOURCE; LOW-ENERGY PLASMA; PS;

PLASMAS;

EID: 32944458654     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.09.002     Document Type: Article

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