Metal deposition on Ge surfaces

ECS Transactions

Volumn 1, Issue 3, 2006, Pages 220-227

  Sioncke, S ^a   Onsia, B ^a,b   Struys, K ^c   Rip, J ^a   Vos, R ^a   Meuris, M ^a   Mertens, P ^a   Theuwis, A ^c  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c UMICORE   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ETCHING; PH EFFECTS; SILICON; SOLUTIONS;

AMMONIA PEROXIDE MIXTURE( APM); COCKTAIL OF METALS; METAL CONCENTRATION; METAL DEPOSITION;

GERMANIUM;

EID: 32844458118     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

1. M. Meuris, P.W. Mertens, A. Opdebeeck, H.F. Schmidt, M. Depas, G. Vereecke, M.M. Heyns, Solid State Technology, 38 (7), 109-113 (1995)
2. L. Loewenstein, F. Charpin, and P.W. Mertens, Journal of The Electrochemical Society, 146 (2), 719-727 (1999).
3. W. Fyen, 'A fundamental study of the rinsing and drying step in semiconductor wet cleaning', PhD dissertation, Faculty of Applied Sciences, K.U.Leuven, p 130, (2003).
4. P.W. Mertens, L.M. Loewenstein, R. Vos, S. De Gendt, T. Bearda, and M.M. Heyns, in the Eighth International Symposium on Silicon Materials Science and Technology, H. R. Huff, H. Tsuya, and U. Gšsele, Editors, PV 98-1, p592-606, The Electrochemical Society Proceedings Series, Pennington, NJ (1998).
5. R.O. James, T.W. Healy, Journal of Colloid and Interface Science, 10 (1), 65-81 (1972).
6. L.M. Loewenstein, P.W. Mertens, Solid State Phenomena, 65-66, 1-6 (1999)
7. B. Onsia, T. Conard, S. De Gendt, M. Heyns, I. Hoflijk, P. Mertens, M. Meuris, G. Raskin, S. Sioncke, I. Teerlinck, A. Theuwis, J. Van Steenbergen and C. Vinckier, Solid State Phenomena, 103-104, 27-30 (2005).