Vacancy defects induced in sintered polished UO 2 disks by helium implantation

Applied Surface Science

Volumn 252, Issue 9, 2006, Pages 3256-3261

  Labrim, H ^a,c   Barthe, M F ^a,c   Desgardin, P ^a,c   Sauvage, T ^a,c   Blondiaux, G ^a,c   Corbel, C ^b,c   Piron, J P ^b,c  

^a Centre National de la Recherche Scientifique   (France)

^b LABORATOIRE DES SOLIDES IRRADIÉS   (France)

^c IRFM   (France)

Author keywords

Doppler broadening; Helium implantation; Slow positron beam; Uranium dioxide; Vacancy defects

Indexed keywords

DOPPLER EFFECT; HELIUM; ION IMPLANTATION; POSITRON ANNIHILATION SPECTROSCOPY; SINTERING; SPECTROMETERS;

HELIUM IMPLANTATION; SLOW POSITRON BEAM; VACANCY DEFECTS;

URANIUM DIOXIDE;

EID: 32644487065     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.08.045     Document Type: Article

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